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We report the first measurement of high-precision cross section for e(+)e(-) annihilation into 2pi(0) final states. This cross section is extracted from a precise measurement of the photon-photon scattering amplitude at low energies, performed with circularly polarized photons. The best e(+)e(-) cross section measurement to date is obtained, with a statistical and systematic precision of better than 1%. that have sufficient thickness and are made of a metal material such as Cu, Al, Ag, Ni, Mo, Ti, Fe or Nb or a semiconductor material such as Si, GaAs, InP or ZnS. (2) Conductive Layer To Be Etched When the conductive layer to be etched includes a polycrystalline silicon layer, the polycrystalline silicon layer is etched as described above. On the other hand, when the conductive layer to be etched includes a semiconductor layer, the semiconductor layer is etched as described above. In the case where the conductive layer to be etched includes a polycrystalline silicon layer, a method of etching the polycrystalline silicon layer to form a desired resist pattern is used. (3) Insulating Layer To Be Etched The insulating layer to be etched is etched by the CF4 as the main etching gas, and in this case, a region of the insulating layer to be etched is also etched by the CF4 as the etching gas, so that the insulating layer is partially etched. As the process of depositing the insulating layer, the insulating layer is deposited by using the CVD method, the PEALD method or the CVD method using a silane-based compound gas or a disilane-based compound gas as the source gas, and a vapor deposition rate is adjusted in consideration of an etching rate of the insulating layer, so that the thickness of the insulating layer to be etched is adjusted to be approximately equal to a desired thickness. 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