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We report the first measurement of high-precision cross section for e(+)e(-) annihilation into 2pi(0) final states. This cross section is extracted from a precise measurement of the photon-photon scattering amplitude at low energies, performed with circularly polarized photons. The best e(+)e(-) cross section measurement to date is obtained, with a statistical and systematic precision of better than 1%. that have sufficient thickness and are made of a metal material such as Cu, Al, Ag, Ni, Mo, Ti, Fe or Nb or a semiconductor material such as Si, GaAs, InP or ZnS. (2) Conductive Layer To Be Etched When the conductive layer to be etched includes a polycrystalline silicon layer, the polycrystalline silicon layer is etched as described above. On the other hand, when the conductive layer to be etched includes a semiconductor layer, the semiconductor layer is etched as described above. In the case where the conductive layer to be etched includes a polycrystalline silicon layer, a method of etching the polycrystalline silicon layer to form a desired resist pattern is used. (3) Insulating Layer To Be Etched The insulating layer to be etched is etched by the CF4 as the main etching gas, and in this case, a region of the insulating layer to be etched is also etched by the CF4 as the etching gas, so that the insulating layer is partially etched. As the process of depositing the insulating layer, the insulating layer is deposited by using the CVD method, the PEALD method or the CVD method using a silane-based compound gas or a disilane-based compound gas as the source gas, and a vapor deposition rate is adjusted in consideration of an etching rate of the insulating layer, so that the thickness of the insulating layer to be etched is adjusted to be approximately equal to a desired thickness. After the insulating layer to be etched is etched, a conductive layer to be next processed is deposited on the insulating layer to be etched by the above-described method, so that the insulating layer and the conductive layer to be processed are prevented from being electrically shorted. When the insulating layer is thin, it is desirable to perform etching in two steps. In the first step, the insulating layer is etched by the CF4. In the second step, the remaining insulating layer is further etched by the same gas as the etching gas of the insulating layer, but the pressure is lower than that in the first step. The reason is as follows. When the etching is performed at a high temperature 1a423ce670 IUWEshare Disk Partition Recovery Wizard Keymacro is a great tool designed to replace the standard keyboard. It allows you to customize your keyboard layout and change the keyboard. The software is absolutely free. 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